Electron Microscope Facility
Our state-of-the-art electron microscopy facilities allow researchers to see and measure things at the micro, nano and atomic scales
FEI Quanta 3D FEG FIB-SEM
The FEI Quanta 3D FEG FIB-SEM enables imaging, analysis and manipulation of microstructures using a combination of a field-emission gun scanning electron microscope with a gallium focused ion beam and a platinum gas-injection system.
Applications:
- Site-specific sectioning with imaging, EDS or EBSD
- Serial sectioning with imaging, EDS or EBSD
- Site-specific sample preparation for TEM and APT
- Nano-scale and micro-scale milling, deposition and fabrication
- In-situ mechanical and electrical testing
Features:
Detectors
- Secondary electron (SE): Everhart-Thornley
- Backscatter electron (BSE): Solid State Diode
- Energy dispersive X-ray (EDX): Apollo
- Electron backscatter diffraction (EBSD): Hikari
Accessories
- Micromanipulator
- Spring table and force measurement system
- Sub-stage for mechanical and electrical testing
Automation software
- Multi-site milling (AutoFIB)
- TEM specimen preparation (AutoTEM)
- Serial sectioning and imaging (Slice and View)
- Serial sectioning and EBSD/EDS (EBS3)
Data acquisition software
- Energy dispersive X-ray (EDX): Genesis
- Electron backscatter diffraction (EBSD): OIM
Data processing software
- 2D images (Photoshop, ImageJ)
- 3D images (Amira, Avizo, Paraview)
- 2D EBSD data (Channel, CrossCourt, OIM)
- 3D EBSD data (Dream3D, OIM)
Specifications:
Electron optics
- FEG source, high current electron column
- Accelerating voltage: 0.2 to 30 kV
- Probe current: Up to 200 nA
- Magnification: 30 x to 1280 kx (Quad Mode)
Ion optics
- Ga liquid metal ion source, high current ion column
- Accelerating voltage: 2 to 30 kV
- Probe current: 1 pA to 65 nA
- Magnification: 40 x to 1280 kx (Quad Mode)
- Charge neutralisation mode
Electron beam resolution
- High vacuum: 1.2 nm at 30 kV (SE), 2.5 nm at 30 kV (BSE), 2.9 nm at 1 kV (SE)
- Low vacuum: 1.5 nm at 30 kV (SE), 2.5 nm at 30 kV (BSE), 2.9 nm at 3 kV (SE)
- Extended low vacuum (ESEM): 1.5 nm at 30 kV (SE)
Ion beam resolution
- 7 nm at 30 kV at beam coincident point, 5 nm at 30 kV at optimal working distance
Chamber vacuum
- High vacuum: < 6E-4 Pa
- Low vacuum: 10 to 130 Pa
- Extended low vacuum (ESEM): 10 to 4000 Pa
Micromanipulator
- Range: 240° on A-axis, 240° on B-axis, 12 mm on C-axis
- Resolution: 10-7 rad on A-axis, 10-7 rad on B-axis, < 0.5 nm on C-axis
- Torque / Force: 3 – 4 Nmm on A-axis, 3 – 4 Nmm on B-axis, 1 N on C-axis
- Tips: R100 nm sharp tip, R100 nm cube corner, ø1 µm flat punch
Spring Table and Force Measurement Analysis System
- Force Range: 10 nN to 50 mN
- Displacement Range: Depends on SEM image magnification and resolution
Sub-stage
- Force: Maximum 4 N, Resolution: 250 µN
- Displacement: Maximum 20 mm, Resolution 0.5 nm, Repeatability 100 nm
- Electrical Measurement: Maximum 50 mA DC using user-supplied equipment
Contact: Dr Mark Nave, Dr Adam Taylor, Dr Jiangting Wang
Zeiss Supra 55VP FEG SEM
The Supra 55VP is a high resolution scanning electron microscope (SEM) that uses a Schottky-type field-emission gun (FEG). The microscope has variable pressure (VP) capability enabling the study of non-conductive materials.
Features
- Lens-mounted angular selective backscatter (AsB) detector with high crystal orientation sensitivity with sub-micron spatial resolution.
- Oxford Instruments Aztec EBSD and EDS system with a Nordlys-F EBSD detector (with forescatter imaging capabilities) and an X-Max 20 mm2 drift EDS detector.
- Variable pressure secondary electron (VPSE) detector.
- High efficiency In-lens secondary electron detector.
- High current mode.
- 0.02 to 30 kV operating range.
- In-situ mechanical testing capability via a Kammrath & Weiss system. Up to 800°C with a 1 kN and 5 kN load cells.
Contact: Dr Huaying (Maggie) Yin, Dr Adam Taylor
JEOL NeoScope Tabletop SEM
The NeoScope is an easy to use compact tabletop SEM with low vacuum capability for imaging of non-conductive material. It has a secondary electron (SE) detector and backscatter electron (BSE) detector that can be used when the microscope is in a low vacuum condition.
Contact: Dr Huaying (Maggie) Yin
ZEISS LEO 1530 FEG SEM
The LEO 1530 is a high resolution scanning electron microscope (SEM) that uses a Schottky-type field-emission gun (FEG).
Features:
- Oxford Instruments Aztec EBSD system with Nordlys S detector with forescatter imaging capabilities.
- Retractable backscattered electron detector (BSD).
- High efficiency In-lens secondary electron detector.
- 200 V to 30 kV operating range.
- In-situ mechanical testing capability via a Kammrath & Weiss system. Up to 800°C with a 1 kN and 5 kN load cells. Tilt option for combined EBSD mapping.
Contact: Dr Huaying (Maggie) Yin, Dr Adam Taylor
JEOL JEM 2100 TEM
The JEOL JEM-2100 is a high-performance Transmission Electron Microscope (TEM) with a Lanthanum Hexaboride (LaB6) electron source for analyses at the sub-nanometre level in materials science, nanotechnology and life science.
Features:
High resolution imaging with specialist characterisation capabilities of EDS and Cryo Imaging.
Specifications:
- 200 kV TEM HR version with LaB6 source
- Operating kV: 80 to 200
Spot diameter
- TEM mode: 20 to 200 nm
- EDS, NBD & CBD mode: 1.0 to 25 nm
Magnification range
- LOW MAG mode: 50x to 6,000x
- MAG mode: 2000x to 1,500,000x
Resolution
- Point: 0.23 nm
- Lattice 0.14 nm
Image capture
- GATAN Orius SC1000 camera: Progressive interline device, Sensor area 36 x 24 mm, 4008 x 2672 pixels (9 µm ea)
- BF and HAADF STEM detectors
Additional Characterisation Capabilities:
JEOL JED-2300T Energy Dispersive X-Ray Analyser, Dry SD30GV Detector 0.26 sr
- Effective area of detector: 30 mm2
- Energy resolution (FWHM): 133 eV
- Detectable element range: B to U
Cryo TEM imaging with Gatan 914 series Cryo-transfer Tomography Holder
Contact: Rosey Squire, Dr Huaying (Maggie) Yin
JEOL JEM 2100F FEG TEM
The JEOL JEM-2100F is a high-performance Transmission Electron Microscope (TEM) with a field emission electron source for analyses at the atomic/molecular level in materials science, nanotechnology and life science.
Features:
High resolution imaging with specialist characterisation capabilities of EDS, EFTEM, EELS, and ACOM.
Specifications:
200kV TEM HR version with ZrO/W (100) field emission source
Spot diameter
- TEM mode: 2-5 nm
- EDS, NBD & CBD mode: 0.5 to 2.4 nm
Magnification range
- LOW MAG mode: 50x to 6,000x
- MAG mode: 2000x to 1,500,000x
Resolution
- Point: 0.23 nm
- Lattice: 0.1 nm
Image capture
- GATAN Orius SC1000 camera: Progressive interline device, Sensor area 36 x 24 mm, 4008 x 2672 pixels (9 µm ea)
- BF and HAADF STEM detectors
Additional Characterisation Capabilities
- JEOL JED-2300TPlus Dry SD60GV Detector
- Effective area of detector: 60 mm2
- Energy resolution (FWHM): 133 eV or better (at 55Fe, 5.9 keV)
- Window: Super UTW (ultra-thin window) type
- Detectable element range: B to U
- GATAN GIF Quantum 965 Post column energy filter and EELS spectrometer. Energy resolution 0.10 eV FWHM
- NanoMEGAS ASTAR Automated Crystal Orientation and phase mapping package for TEM
- GATAN 648 Vacuum Transfer Holder
Contact: Rosey Squire, Dr Huaying (Maggie) Yin
JEOL JSM 7800F FEG-SEM
The JSM-7800F is an ultrahigh resolution scanning electron microscope (SEM) that uses a Schottky-type field-emission gun (FEG). The system includes the JEOL Super Hybrid Lens (SHL) reducing the chromatic and spherical aberrations which leads to improved resolution, especially at low accelerating voltages.
Features:
- 4 types of detectors; upper electron detector (UED), upper secondary electron detector (USD), backscattered electron detector (BED) and a lower electron detector (LED).
- Beam deceleration with gentle beam (GB) mode provides charge balance and high-resolution imaging.
- Energy filtered imaging allowing secondary and backscattered electrons to be selected accurately, even at low accelerating voltages.
- Large depth of field mode.
- Oxford Instruments Aztec EBSD and EDS system with a Nordlys-nano EBSD detector (with forescatter imaging capabilities) and an X-Max 50 mm2 drift EDS detector.
- Scanning transmission electron microscope (STEM) detector with bright-field and dark-field imaging.
- 0.01 kV to 30 kV.
Contact: Dr Adam Taylor
Cameca LEAP 5000 XR Atom Probe
The LEAP 5000 XR is a cutting-edge local electrode atom probe instrument with a reflectron system for high resolution by time-of-flight mass spectroscopy. This technique offers atom by atom, 3D reconstruction of materials resulting in chemical analysis with near-atomic scale spatial resolution. The UV laser allows metals, semiconductors and insulators alike to be analysed.
Features:
- Voltage and laser pulsing mode.
- Advanced laser pulsing capable of repetition rates of up to 500 kHz.
- Specimen temperature 25 – 100 K.
- Up to 108 atoms per hour.
- 200 nm field of view.
Contact: Dr Adam Taylor, Dr Ross Marceau
Contact us
Electron Microscope Facility
General enquiries
Email the Electron Microscope Facility